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Diameter(mm) |
50.8~127 |
Material |
monocrystalline silicon wafer |
Growth method |
FZ |
Dia.& tolerance (mm) |
X±0.1 |
Type/Dopant | N-Type(NTD) |
Orientation | ‹111› / ‹100› |
Resistivity(Ω.cm) | 15--1000 |
RRG(%) | <6 |
Oxygen content (at cm-3 ) | ≤1×1016 |
Carbon content (at cm-3 ) | ≤2×1016 |
Thickness tolerance (um) | According to the customer |
TTV(um | ≤5 / Or according to the customer |
BOW(um) | ≤15/ Or according to the customer |
IC grade silicon wafer