AZO rotary sputtering target High density, high even low electric resistance sputtering process is stability provide bondin AZO rotary sputtering target 1,the purity is more than 99.99%2,the relative density is more than 98%.3,The size is as following:The plate sputtering target:4,all size within 600*300mm*20mm5,The cylinder sputtering target:6,the diameter:50-400mm7,the thickness:5-20mm8,the ...