AZO rotary sputtering target High density, high even low electric resistance sputtering process is stability provide bondin

AZO rotary sputtering target 

1,the purity is more than 99.99%

2,the relative density is more than 98%.

3,The size is as following:

The plate sputtering target:

4,all size within 600*300mm*20mm

5,The cylinder sputtering target:

6,the diameter:50-400mm

7,the thickness:5-20mm

8,the height:50-500mm

AZO rotary sputtering target