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sputtering target material

Found 878730 Products
sputtering target material
Magnetron-controlled sputtering coating target material Specification:Pure molybdenum,titanium,nickel target, Ni80Cr20, 316L Magnetron-controlled sputtering coating target materialSpecification: molybdenum,titanium,nickel target, Ni80Cr20, 316L sputtering target material
Gr5 titanium sputtering target
Titanium sputtering target 1.Sputtering/ Coating material 2.Dia.100~400mm Height 20~1000mm 3.ASTM B381, 4.MOQ: 1pc Titanium sputtering targetMaterial : Gr1,Gr2,Gr3 ... ,Gr4,Gr5,Gr7,Gr12Specification: Square/ Round Target Dia. 100~400mm Height. 20 ...
Supplier: Baoji Xinnuo New Metal Materials Co., Ltd. [China Manufacturers]
Titanium Sputtering Target
Titanium Sputtering Target We special in offer Titanium Target according to the customer's personal drawings and requirement. Titanium Sputtering TargetMaterial: Gr1, Gr2, Gr3, Gr5 ...
Supplier: Baoji City Changsheng Titanium Co., Ltd. [China Manufacturers]
Tantalum sputtering target
Tantalum sputting target material : Ta . purity : >=99.95% grade :3N 3N5 surface finish :16Rms max or customer's MTantalum sputting targetcircular target : dia. from 25 to 350mm width : from 3 to 28mmrectangular targets : thickness : 1mm to 12.5mm widthness : max 600mm length : :max 1500mmsize tolerance : +-0.02 on all dimesionssurface : 6sides or 4sides polish Tantalum sputtering target
Supplier: Baoji Linuo Non-Ferrous Metal Co., Ltd. [China Manufacturers]
niobium sputtering target
products name:niobium sputtering target size:12*160*610mm(also according to customer's design) ... label contain following information:> Material composition in atomic percent> Products number> Dimensions> Purity Other information such as supplier quality control niobium sputtering target
Supplier: Baoji Chuangxin Metal Materials Co., Ltd. [China Manufacturers]
Target material made of plasma spraying production line
... target material spraying and manufacturing equipment technical processing series:Magnetron sputtering film coating target materials: metal sputtering film coating target materials, alloy sputtering film coating target materials, ceramic sputtering ...
Supplier: Guangzhou Sanxin Metal S & T Co., Ltd. [China Manufacturers]
wolfram sputtering target.
... wolfram sputtering target, wolfram target tungsten sputtering target,tungsten target Purity: w >99.95% Density: >= 19.15g /cm wolfram sputtering target, wolfram target, w targettungsten sputtering target, ... tungsten targetPurity: w >99.95%Density: >= 19.15g /cm3 Appearance: It has metallic silver luster.Surface Condition: Material ...
Supplier: Luoyang Sifon Electronic Co., Ltd. [China Manufacturers]
Tantalum Coating Target, Tantalum sputtering target
Tantalum sputtering target, Tantalum disc Grade: RO5200,RO5252,RO5255 Standard ASTM B 708- ... foil tube ,rod,wire,sheet,plate, ,rod,strip,target and so on.Tantalum sputtering target, Tantalum targetMaterial: RO5200, RO5400, RO5252(Ta-2.5W ... Special sizes are available upon customer’s requirement. Tantalum Coating Target, Tantalum sputtering target
Supplier: Changsha South Tantalum Niobium Co., Ltd. [China Manufacturers]
Rotatable Sputtering Target
... Ownership thanks to the advantages of rotatable magnetron technology (more material inventory, higher utilization grade, better cooling & higher stability)High volume ... %), Ta(99.95%), Nb(99.95%), Mo(99.95%) Rotatable Sputtering Target
Supplier: Santech Applied Technology Co., Ltd. [China Manufacturers]
pure chromium sputtering target
... 3.100mm*50mm, 80mm*45mm or as customer request 4.Sputtering target for coating 1.Specification:100*40mm,80*40mm,diameter:40mm ... →Rod billet→Precision Forging→Mechanical working→chrome bar→machining→chrome target 4.We also manufacture the products as follows:² titanium,nickel ... /rod: gr1,gr2,gr5,monel400,monelk500² Titanium,chromium,nickel alloy target: round,sheet,tube, 100*40/45mm,80*45mm,60*45mm ...
Supplier: Baoji Ying Titanium Metal Materials Co., Ltd. [China Manufacturers]
AZO sputtering target
AZO sputtering target High density, high even, low electric resistance, sputtering process is stability AZO sputtering target the purity is more than 99.99% ,the relative density is more than 99%.The size is as following:The plate sputtering target:all size within 600*300mm*20mmThe cylinder sputtering target:the diameter:50-400mmthe thickness:5-20mmthe height:50-500mm. AZO sputtering target
Supplier: Yixing Balen Optoelectronic Material Co., Ltd. [China Manufacturers]
Silicon Target sputtering target Poly/Single Crystal target
Silicon Target Purity: Si 5N or 6N Resistity:0.02ohm/cm max;0.5-5 ohm/cm max. Type: Single and Poly Si Targets Silicon Target sputtering targetType: Single crystal Si target and Poly crystal Si targetPurity: Si:99.999% min. and 99.9999% min.Resistivity: 0.02ohm·cm max., 0.02ohm·cm max. and 0.5-5 ohm·cmSizes: Length:300mm max.Width:125mm max.Thickness: 2mm-20mm
High-density ITO target material
... = 95/5wt%Main Usage: ITO target material used in evaporation, evaporation ITO powder and ITO target material are made up of the mixture ... of In2o3 and Sno2, which is an important raw material of making ... rods.Chemical formula: In2O3/SnO2 = 95/5wt%Main Usage: ITO target material used in evaporation, evaporation Preparation of ITO conductive glass and ...
Supplier: Parkeli United Development Technology Co., Ltd. [China Manufacturers]
Magnesium Sputtering Target
Purity is 4N, Sputtering Targets Shape can be Discs, Rectangle, Plates, Sheets, Tube, Foils, ... , Witdh<300mm, Thickness>1mm) Tube Target / Rotation sputtering Target (Outer Dia < 300mm, Thickness > 2mm)Sputtering Targets Materials list: Metal sputtering targets: Aluminum (Al),Antimony (Sb ...
Supplier: Xian Yuechen Metal Products Co., Ltd. [China Manufacturers]

sputtering target

Oct 31, 2012
sputtering target
... laser implosions of spherical shell TI-AL TARGET TI-ZI TARGET TI-MO TARGET TI-CH TARGET TI-ALLOY TARGETAbsorption-spectroscopy measurements using an ... the EXAFS spectrum indicating cold titanium close to peak compression. sputtering target
Supplier: Xi'an Space Star Technology (Group) Corporation [China Manufacturers]
W-Ti Sputtering Target
... .995≥99<10Ø400×40≤1.6Applications:Tungsten titanium alloy sputtering target can be used to make the semiconductor chips, the new ... the ceramic thin film circuit’s diffusion barrier. W-Ti Sputtering Target
silicon target material for coating material
... ) Widely used in industrial refractories, powder metallurgy industry,polysilicon,silicon target material,silicon nitride,silicon carbon bar and semi-conductors. (2)Used ...
Supplier: Beijing DDZL Si Co., Ltd. [China Manufacturers]
Titanium sputtering target
... . 3.Shape:round 4.Technique:Forged, 5.MOQ:10KG Titanium sputtering targetfor industrial use.ASTM GB.Diameter:50-300,Shape:round ... Non-ferrous Metal Research Test.HIGH QUAILTY COMPETITIVE PRICE Titanium sputtering target
Supplier: Baoji Intelle Metals Co., Ltd. [China Manufacturers]
Chromium sputtering target
titanium nickel ti-al zirconium ,chromium target for sputtering different diamer
Supplier: Baoji Queen Titanium Co., Ltd. [China Manufacturers]

Titanium target

Dec 22, 2012
Titanium target
Titanium sputtering target Material:Titanium 99.6% Size:Diameter 100mm thickness 40mm We can manufacture titanium target according to customer's drawing. Titanium target
Supplier: Baoji Boze Metal Products Co., Ltd. [China Manufacturers]
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